GAIA3 MODEL 2016

GAIA3 model 2016 is the ideal instrument for applications in which imaging at low beam energies is a requirement to preserve delicate structures in the samples that can get easily damaged by the electron beam such as low-k dielectric materials, photoresists or uncoated biological specimens. In terms of sample modification, GAIA3 model 2016 represents the most suitable solution for challenging nanomachining and nanofabrication.