PLASMA PROFILING TIME OF FLIGHT MASS SPECTROMETER

Ultra-Fast, Sensitive and High Resolution Depth Profiling Technique

PP-TOFMS couples a glow discharge plasma to an ultra-fast time of flight mass spectrometer and provides chemical analysis of solid materials as function of depth.

Plasma Profiling Time Of Flight Mass Spectrometer

Features

Fast and direct analysis
The High-Density Plasma results in high Sputtering Rate and allows for Measuring Thick Layers up to 100 μm.
Despite the mm size crater formed, layers as thin as 1 nm are measured.
The separation of sputtering and ionization processes in the discharge volume gives the capability of a Calibration Free Semi Quantitative Analysis.
The use of pulsed RF excitation permits the analysis of conductive and insulating, inorganics, organics, and hydrides materials or layers.
In contrast with sequential mass spectrometers, TOFMS offers full mass spectrum at any depth, offering elemental (from H to U) and molecular information, including isotopic monitoring.
The Temporal Ion response over the RF source period is capitalised for high sensivity and to avoid isobaric interferences.
Enhance Signal to Noise ratio
Multidimensional Software

Applications

Photovoltaics

Photonics rare earths

Ion implantation

Hybrid materials

Electrodes of Li batteries

Corrosion studies

Materials science

Services

For Support Services

Contact Details:

Tel. : (91-22) 2500 2631/ 2500 2632 Fax : (91-22) 2500 2636