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The world’s first fully integrated Xe plasma source focused ion beam (FIB) with scanning electron microscopy (SEM) enables extremely high ion currents up to 2 μA which results in increased milling speeds that can be up to 50 times faster compared to conventional Ga source FIBs.The configuration in the FIB-SEM systems is such that the electron and ion beam focal points coincide, which results in the optimisation of many applications. This feature enables simultaneous SEM imaging during FIB milling tasks – a significant leap in terms of performance and throughput in all those FIB operations which demand extremely high level of precision. FERA3 features high-performance electronics for faster image acquisition, ultra-fast scanning system along with compensation of static and dynamic image aberrations and built-in scripting for user-defined applications.
Modern electron optics
Extremely powerful Xe plasma FIB column
ECR-generated Xe plasma ion source FIB columnfor achieving the most challenging large-scale milling tasks in unbeatable short times frames
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