GAIA3 Model 2016

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GAIA3 model 2016 is the ideal instrument for applications in which imaging at low beam energies is a requirement to preserve delicate structures in the samples that can get easily damaged by the electron beam such as low-k dielectric materials, photoresists or uncoated biological specimens. In terms of sample modification, GAIA3 model 2016 represents the most suitable solution for challenging nanomachining and nanofabrication.
Triglav™ – newly designed UHR electron column
High-performance Ga FIB column for ultimate precision in nanoengineering.
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