The patented UFS allows for Ultra Fast Sputtering of polymeric layers offering enhanced signal/noise ratios and the ability to measure embedded layers below thick polymeric ones with excellent depth resolution. The example here shows a DVD featuring 6 layers in 100 nm below a 70 μm thick polymeric layer.
The excellent optical resolution of the instrument even allows simultaneous measurements of H, and its isotope Deuterium, which is of great interest for nuclear research. Pulsed RF GD-OES also measures solar cells, corroded surfaces, Ag-TiCN bioactive coatings, materials for H storage, laser surface treatments, alloys and compounds, oxides and nitrides, thin and thick films etc.
