LYRA3

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LYRA3 satisfies the nowadays needs for sample characterisation and microanalysis in materials science and industry. In addition, beam / ion lithography as well as circuit editing of multi-layered microelectronic devices, are tasks at which LYRA3 excels. High-throughput and powerful yet easy-to-use software allows even novice users to effortlessly implement complex FIB-SEM applications such as 3D reconstructions, serial cross-sectioning and lamellae preparation as well as correlative microscopy.

Features

High Performance Electron Optics

Unique Wide Field Optics™ design with a proprietary Intermediate Lens (IML) offering a variety of working and displaying modes, for instance with enhanced field of view or depth of focus, etc.
Real time In-Flight Beam Tracing™ for performance and beam optimization, integrated with the well-established software Electron Optical Design. It also includes a direct and continuous control of the beam spot size and beam current.
Fully automated electron optics set-up and alignment
Fast imaging rate
A unique live stereoscopic imaging using the advanced 3D Beam Technology which opens up the micro and nano-world for an amazing 3D experience and 3D navigation.