LYRA3 satisfies the nowadays needs for sample characterisation and microanalysis in materials science and industry. In addition, beam / ion lithography as well as circuit editing of multi-layered microelectronic devices, are tasks at which LYRA3 excels. High-throughput and powerful yet easy-to-use software allows even novice users to effortlessly implement complex FIB-SEM applications such as 3D reconstructions, serial cross-sectioning and lamellae preparation as well as correlative microscopy.